At present, our country has become the largest semiconductor market and continues to maintain the fastest growth rate. With the breakthrough of domestic semiconductor core material technology, it is expected that the demand for semiconductor materials in our country will be released more. The production process of semiconductor materials involves multi-channel processes such as polycrystalline synthesis, cutting after single crystal growth, edging, grinding, polishing, cleaning, and multi-step process procedures such as waste liquid treatment. In the production process, whether each process step is qualified requires accurate and reliable detection means. Inductively coupled plasma emission spectrometer (ICP-OES) is often used to determine the content of constant, trace, trace metal elements or non-metallic elements in various substances, and is widely used in the semiconductor industry. In this paper, ICP-OES is used to establish a method for the determination of gallium, iron, vanadium, copper, calcium, magnesium, aluminum, zinc and sulfur in electrolyte, filtrate, mother liquor, tail liquor and qualified solution in the semiconductor material production process. Attachment download